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The objective of this study is to explore the
response of an activated Rhizobium tibeticum inoculum
with a mixture of hesperetin (H) and apigenin (A) to
improve the growth, nodulation, and nitrogen fixation of
fenugreek (Trigonella foenum graecum L.) grown under
nickel (Ni) stress. Three different sets of fenugreek seed
treatments were conducted, in order to investigate the
activated R. tibeticum pre-incubation effects on nodulation,
nitrogen fixation and growth of fenugreek under Ni stress.
Group (I): uninoculated seeds with R. tibeticum, group (II):
inoculated seeds with uninduced R. tibeticum group (III):
inoculated seeds with induced R. tibeticum. The present
study revealed that Ni induced deleterious effects on rhizobial
growth, nod gene expression, nodulation, phenylalanine
ammonia-lyase (PAL) and glutamine synthetase
activities, total flavonoids content and nitrogen fixation,
while the inoculation with an activated R. tibeticum significantly
improved these values compared with plants
inoculated with uninduced R. tibeticum. PAL activity of
roots plants inoculated with induced R. tibeticum and
grown hydroponically at 75 and 100 mg L-1 Ni and was
significantly increased compared with plants receiving
uninduced R. tibeticum. The total number and fresh mass
of nodules, nitrogenase activity of plants inoculated with
induced cells grown in soil treated up to 200 mg kg-1 Ni
were significantly increased compared with plants inoculated
with uninduced cells. Plants inoculated with induced
R. tibeticum dispalyed a significant increase in the dry
mass compared with those treated with uninduced R.
tibeticum. Activation of R. tibeticum inoculum with a
mixture of hesperetin and apigenin has been proven to be
practically important in enhancing nodule formation,
nitrogen fixation and growth of fenugreek grown in Ni
contaminated soils.
The objective of this study is to explore the
response of an activated Rhizobium tibeticum inoculum
with a mixture of hesperetin (H) and apigenin (A) to
improve the growth, nodulation, and nitrogen fixation of
fenugreek (Trigonella foenum graecum L.) grown under
nickel (Ni) stress. Three different sets of fenugreek seed
treatments were conducted, in order to investigate the
activated R. tibeticum pre-incubation effects on nodulation,
nitrogen fixation and growth of fenugreek under Ni stress.
Group (I): uninoculated seeds with R. tibeticum, group (II):
inoculated seeds with uninduced R. tibeticum group (III):
inoculated seeds with induced R. tibeticum. The present
study revealed that Ni induced deleterious effects on rhizobial
growth, nod gene expression, nodulation, phenylalanine
ammonia-lyase (PAL) and glutamine synthetase
activities, total flavonoids content and nitrogen fixation,
while the inoculation with an activated R. tibeticum significantly
improved these values compared with plants
inoculated with uninduced R. tibeticum. PAL activity of
roots plants inoculated with induced R. tibeticum and
grown hydroponically at 75 and 100 mg L-1 Ni and was
significantly increased compared with plants receiving
uninduced R. tibeticum. The total number and fresh mass
of nodules, nitrogenase activity of plants inoculated with
induced cells grown in soil treated up to 200 mg kg-1 Ni
were significantly increased compared with plants inoculated
with uninduced cells. Plants inoculated with induced
R. tibeticum dispalyed a significant increase in the dry
mass compared with those treated with uninduced R.
tibeticum. Activation of R. tibeticum inoculum with a
mixture of hesperetin and apigenin has been proven to be
practically important in enhancing nodule formation,
nitrogen fixation and growth of fenugreek grown in Ni
contaminated soils.
The objective of this study is to explore the
response of an activated Rhizobium tibeticum inoculum
with a mixture of hesperetin (H) and apigenin (A) to
improve the growth, nodulation, and nitrogen fixation of
fenugreek (Trigonella foenum graecum L.) grown under
nickel (Ni) stress. Three different sets of fenugreek seed
treatments were conducted, in order to investigate the
activated R. tibeticum pre-incubation effects on nodulation,
nitrogen fixation and growth of fenugreek under Ni stress.
Group (I): uninoculated seeds with R. tibeticum, group (II):
inoculated seeds with uninduced R. tibeticum group (III):
inoculated seeds with induced R. tibeticum. The present
study revealed that Ni induced deleterious effects on rhizobial
growth, nod gene expression, nodulation, phenylalanine
ammonia-lyase (PAL) and glutamine synthetase
activities, total flavonoids content and nitrogen fixation,
while the inoculation with an activated R. tibeticum significantly
improved these values compared with plants
inoculated with uninduced R. tibeticum. PAL activity of
roots plants inoculated with induced R. tibeticum and
grown hydroponically at 75 and 100 mg L-1 Ni and was
significantly increased compared with plants receiving
uninduced R. tibeticum. The total number and fresh mass
of nodules, nitrogenase activity of plants inoculated with
induced cells grown in soil treated up to 200 mg kg-1 Ni
were significantly increased compared with plants inoculated
with uninduced cells. Plants inoculated with induced
R. tibeticum dispalyed a significant increase in the dry
mass compared with those treated with uninduced R.
tibeticum. Activation of R. tibeticum inoculum with a
mixture of hesperetin and apigenin has been proven to be
practically important in enhancing nodule formation,
nitrogen fixation and growth of fenugreek grown in Ni
contaminated soils.
The study of porous alumina structures has attracted the attention of the scientific community because of their interesting features, which can be leverged for energy storage and many other applications of nanotechnology [1-2]. To fabricate porous anodic
alumina, one uses electrochemical etching (anodization) of aluminum in acidic electrolyte. Most anodization procedures that generate straight pores are done at temperatures below 5˚C in sulfuric, oxalic and/or phospheric acids, as reported in the literature [3]. However in this work, we introduce a novel, simple one -pot synthesis method to develop thin walls of aluminum oxide that conatian lithium ions, for Li-ion battery applications. The anodization of Al fil ms was conducted
in a supersaturated mixture of lithium phosphate and 0.75 M phosphoric acid, as a matrix for the Li-composite electrolyte. For this purpose, aluminum films, a few micrometers thick, were fabricated. Our results show that both the anodization rate and current density, in
the transient curve, decreased as the concentration of LiH 2PO4 in H3PO4 increased. Moreover, the wall thickness becomes thinner for samples anodized in higher concentration of LiH2PO4 in H3PO4.
References
[1] L.G. Vivas et al., Nanotech., 24 (10), (2013) 105703.
[2] Hui Wu et al., Macromol. Chem. Phys., 215 (7), (2014) 584.
[3] G.D. Sulka et al., Electrochem. Soc., 151 (5), (2004) B260.
The study of porous alumina structures has attracted the attention of the scientific community because of their interesting features, which can be leverged for energy storage and many other applications of nanotechnology [1-2]. To fabricate porous anodic
alumina, one uses electrochemical etching (anodization) of aluminum in acidic electrolyte. Most anodization procedures that generate straight pores are done at temperatures below 5˚C in sulfuric, oxalic and/or phospheric acids, as reported in the literature [3]. However in this work, we introduce a novel, simple one -pot synthesis method to develop thin walls of aluminum oxide that conatian lithium ions, for Li-ion battery applications. The anodization of Al fil ms was conducted
in a supersaturated mixture of lithium phosphate and 0.75 M phosphoric acid, as a matrix for the Li-composite electrolyte. For this purpose, aluminum films, a few micrometers thick, were fabricated. Our results show that both the anodization rate and current density, in
the transient curve, decreased as the concentration of LiH 2PO4 in H3PO4 increased. Moreover, the wall thickness becomes thinner for samples anodized in higher concentration of LiH2PO4 in H3PO4.
References
[1] L.G. Vivas et al., Nanotech., 24 (10), (2013) 105703.
[2] Hui Wu et al., Macromol. Chem. Phys., 215 (7), (2014) 584.
[3] G.D. Sulka et al., Electrochem. Soc., 151 (5), (2004) B260.
Electrochemical oxidation of high-purity aluminum (Al) films under low anodizing voltages (1–10) V has been conducted to obtain anodic aluminum oxide (AAO) with ultra-small pore size and inter-pore distance. Different structures of AAO have been obtained e.g. nanoporous and mesh structures. Highly regular pore arrays with small pore size and inter-pore distance have been formed in oxalic or sulfuric acids at different temperatures (22–50 °C). It is found that the pore diameter, inter-pore distance and the barrier layer thickness are independent of the anodizing parameters, which is very different from the rules of general AAO fabrication. The brand formation mechanism has been revealed by the scanning electron microscope study. Regular nanopores are formed under 10 V at the beginning of the anodization and then serve as a template layer dominating the formation of ultra-small nanopores. Anodization that is performed at voltages less than 5 V leads to mesh structured alumina. In addition, we have introduced a simple one-pot synthesis method to develop thin walls of oxide containing lithium (Li) ions that could be used for battery application based on anodization of Al films in a supersaturated mixture of lithium phosphate and phosphoric acid as matrix for Li-composite electrolyte.
Electrochemical oxidation of high-purity aluminum (Al) films under low anodizing voltages (1–10) V has been conducted to obtain anodic aluminum oxide (AAO) with ultra-small pore size and inter-pore distance. Different structures of AAO have been obtained e.g. nanoporous and mesh structures. Highly regular pore arrays with small pore size and inter-pore distance have been formed in oxalic or sulfuric acids at different temperatures (22–50 °C). It is found that the pore diameter, inter-pore distance and the barrier layer thickness are independent of the anodizing parameters, which is very different from the rules of general AAO fabrication. The brand formation mechanism has been revealed by the scanning electron microscope study. Regular nanopores are formed under 10 V at the beginning of the anodization and then serve as a template layer dominating the formation of ultra-small nanopores. Anodization that is performed at voltages less than 5 V leads to mesh structured alumina. In addition, we have introduced a simple one-pot synthesis method to develop thin walls of oxide containing lithium (Li) ions that could be used for battery application based on anodization of Al films in a supersaturated mixture of lithium phosphate and phosphoric acid as matrix for Li-composite electrolyte.
Electrochemical oxidation of high-purity aluminum (Al) films under low anodizing voltages (1–10) V has been conducted to obtain anodic aluminum oxide (AAO) with ultra-small pore size and inter-pore distance. Different structures of AAO have been obtained e.g. nanoporous and mesh structures. Highly regular pore arrays with small pore size and inter-pore distance have been formed in oxalic or sulfuric acids at different temperatures (22–50 °C). It is found that the pore diameter, inter-pore distance and the barrier layer thickness are independent of the anodizing parameters, which is very different from the rules of general AAO fabrication. The brand formation mechanism has been revealed by the scanning electron microscope study. Regular nanopores are formed under 10 V at the beginning of the anodization and then serve as a template layer dominating the formation of ultra-small nanopores. Anodization that is performed at voltages less than 5 V leads to mesh structured alumina. In addition, we have introduced a simple one-pot synthesis method to develop thin walls of oxide containing lithium (Li) ions that could be used for battery application based on anodization of Al films in a supersaturated mixture of lithium phosphate and phosphoric acid as matrix for Li-composite electrolyte.