Low Damage Reductive Patterning of Oxidized Alkyl Self-Assembled Monolayers through Vacuum Ultraviolet Light Irradiation in an Evacuated Environment

Low Damage Reductive Patterning of Oxidized Alkyl Self-Assembled Monolayers through Vacuum Ultraviolet Light Irradiation in an Evacuated Environment

Research Abstract

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Research Authors
Soliman, Ahmed Ibrahim Abdelhamid
Tu, Yudi
Utsunomiya, Toru
Ichii, Takashi
Sugimura, Hiroyuki
Research Department
Department of chemistry
Research Journal
Langmuir
Research Member
Ahmad Ibrahim Abdelhamid Soliman
Research Pages
10829−10837
Research Publisher
American Chemical Society
Research Rank
1
Research Vol
33
Research Website
NULL
Research Year
2017