QMS: Evaluating the side-channel resistance of masked software from source code

QMS: Evaluating the side-channel resistance of masked software from source code

Research Authors
H Eldib, C Wang, M Taha, P Schaumont
Research Department
Electrical Engineering Department
Research Journal
The 51st Design Automation Conference (DAC), 2014 ACM/EDAC/IEEE
Research Member
Mostafa Mohamed Ibrahim Taha
Research Rank
3
Research Year
2014